Abstract



Consumption Infinitive of fossil sources to energy generation has been caused more expanding of the science of using from reproducible energy sources. Solar energy is one of the most important reproducible energy sources which is absorbed and converted to the electric energy by solar cells technology. These solar cells are formed from Si by deposition on the special substrate by chemical vapor deposition (CVD) which this process is much vulnerable in the high temperatures interaction. Hence the technology of production of these solar sheets in the low temperature pronto grown and one of the most common methods to build of solar sheets is chemical vapor deposition (CVD), which has been developed with using of plasma techniques in this method with decreasing the temperature used in synthesis interaction. In this paper has been pointed to applications of plasma technique in coating film by CVD method which named plasma-enhance chemical vapor deposition (PE-CVD) which is very common to producing the solar sheets in large scale.